Efficient Mask Learning for Language Model Fine-Tuning.

Minping Chen|Ruijia Yang|Zeyi Wen


Anthology ID:DBLP:conf/cikm/ChenYW25
Volume:Proceedings of the 34th ACM International Conference on Information and Knowledge Management, CIKM 2025, Seoul, Republic of Korea, November 10-14, 2025
Year:2025
Venue:International Conference on Information and Knowledge Management (CIKM)
Publisher:ACM
Pages:301-311
URL:https://doi.org/10.1145/3746252.3761178
DOI:https://doi.org/10.1145/3746252.3761178
DBLP:conf/cikm/ChenYW25
BibTeX:
@inproceedings{chen-2025-efficient, author = {Minping Chen and Ruijia Yang and Zeyi Wen}, editor = {Meeyoung Cha and Carl Yang and Senjuti Basu Roy and Chanyoung Park and Zhenhui Jessie Li and Noseong Park and Carl Yang and Senjuti Basu Roy and Zhenhui Jessie Li and Jaap Kamps and Kijung Shin and Bryan Hooi and Lifang He}, title = {{Efficient Mask Learning for Language Model Fine-Tuning}}, booktitle = {{Proceedings of the 34th ACM International Conference on Information and Knowledge Management, CIKM 2025, Seoul, Republic of Korea, November 10-14, 2025}}, pages = {301--311}, publisher = {ACM}, year = {2025}, url = {https://doi.org/10.1145/3746252.3761178}, doi = {https://doi.org/10.1145/3746252.3761178} }