Learning Graph Edit Distance via Node Matching Patterns.
| Anthology ID: | DBLP:conf/cikm/LeeK25a |
|---|---|
| Volume: | Proceedings of the 34th ACM International Conference on Information and Knowledge Management, CIKM 2025, Seoul, Republic of Korea, November 10-14, 2025 |
| Year: | 2025 |
| Venue: | International Conference on Information and Knowledge Management (CIKM) |
| Publisher: | ACM |
| Pages: | 1477-1486 |
| URL: | https://doi.org/10.1145/3746252.3761226 |
| DOI: | https://doi.org/10.1145/3746252.3761226 |
| DBLP: | conf/cikm/LeeK25a |
| BibTeX: |
@inproceedings{lee-2025-learning,
author = {Junkyu Lee and
Jongik Kim},
editor = {Carl Yang and
Meeyoung Cha and
Senjuti Basu Roy and
Chanyoung Park and
Zhenhui Jessie Li and
Noseong Park and
Carl Yang and
Senjuti Basu Roy and
Zhenhui Jessie Li and
Jaap Kamps and
Kijung Shin and
Bryan Hooi and
Lifang He},
title = {{Learning Graph Edit Distance via Node Matching Patterns}},
booktitle = {{Proceedings of the 34th ACM International Conference on Information and Knowledge Management, CIKM 2025, Seoul, Republic of Korea, November 10-14, 2025}},
pages = {1477--1486},
publisher = {ACM},
year = {2025},
url = {https://doi.org/10.1145/3746252.3761226},
doi = {https://doi.org/10.1145/3746252.3761226}
}