Reducing Disparate Exposure in Ranking: A Learning To Rank Approach.

Meike Zehlike|Carlos Castillo


Anthology ID:DBLP:conf/www/Zehlike020
Volume:WWW '20: The Web Conference 2020, Taipei, Taiwan, April 20-24, 2020
Year:2020
Venue:The Web Conference (WWW)
Publisher:ACM / IW3C2
Pages:2849-2855
URL:https://doi.org/10.1145/3366424.3380048
DOI:https://doi.org/10.1145/3366424.3380048
DBLP:conf/www/Zehlike020
BibTeX:
@inproceedings{zehlike-2020-reducing, author = {Meike Zehlike and Carlos Castillo}, editor = {Yennun Huang and Irwin King and Tie-Yan Liu and Maarten van Steen}, title = {{Reducing Disparate Exposure in Ranking: A Learning To Rank Approach}}, booktitle = {{WWW '20: The Web Conference 2020, Taipei, Taiwan, April 20-24, 2020}}, pages = {2849--2855}, publisher = {ACM / IW3C2}, year = {2020}, url = {https://doi.org/10.1145/3366424.3380048}, doi = {https://doi.org/10.1145/3366424.3380048} }